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000000504 035__ $$a(DESY)96876
000000504 041__ $$aeng
000000504 082__ $$a530
000000504 245__ $$aInvestigating the interaction of x-ray free electron laser radiation with grating structure
000000504 260__ $$aWashington, DC$$bSoc.$$c2012
000000504 269__ $$a2012
000000504 300__ $$a3033
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000000504 440_0 $$0PERI:(DE-600)1479014-2$$aOpt. Lett.$$v37$$x0146-9592$$y15
000000504 500__ $$3Converted on 2013-05-30 15:42
000000504 500__ $$3Converted on 2013-06-21 19:21
000000504 520__ $$aThe interaction of free electron laser pulses with grating structure is investigated using 4.6±0.1 nm radiation at the FLASH facility in Hamburg. For fluences above 63.7±8.7 mJ/cm2, the interaction triggers a damage process starting at the edge of the grating structure as evidenced by optical and atomic force microscopy. Simulations based on solution of the Helmholtz equation demonstrate an enhancement of the electric field intensity distribution at the edge of the grating structure. A procedure is finally deduced to evaluate damage threshold.
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000000504 7001_ $$0P:(DE-H253)PIP1006655$$aGaudin, J.$$b0$$eCorresponding author
000000504 7001_ $$aOzkan, C.$$b1
000000504 7001_ $$aChalupský, J.$$b2
000000504 7001_ $$aBajt, S.$$b3
000000504 7001_ $$aBurian, T.$$b4
000000504 7001_ $$aVysín, L.$$b5
000000504 7001_ $$01112$$aCoppola, N.$$b6
000000504 7001_ $$aDastjani Farahani, S.$$b7
000000504 7001_ $$aChapman, H. N.$$b8
000000504 7001_ $$0P:(DE-H253)PIP1007188$$aGalasso, G.$$b9
000000504 7001_ $$aHájková, V.$$b10
000000504 7001_ $$aHarmand, M.$$b11
000000504 7001_ $$aJuha, L.$$b12
000000504 7001_ $$aJurek, M.$$b13
000000504 7001_ $$aLoch, R. A.$$b14
000000504 7001_ $$aMöller, S.$$b15
000000504 7001_ $$aNagasono, M.$$b16
000000504 7001_ $$aStörmer, M.$$b17
000000504 7001_ $$01100$$aSinn, H.$$b18
000000504 7001_ $$aSaksl, K.$$b19
000000504 7001_ $$aSobierajski, R.$$b20
000000504 7001_ $$01159$$aSchulz, J.$$b21
000000504 7001_ $$aSovak, P.$$b22
000000504 7001_ $$aToleikis, S.$$b23
000000504 7001_ $$aTiedtke, K.$$b24
000000504 7001_ $$01129$$aTschentscher, T.$$b25
000000504 7001_ $$aKrzywinski, J.$$b26
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000000504 790__ $$aEuXFEL staff
000000504 8560_ $$fjulika.wagner@desy.de
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000000504 900__ $$aSample Environment
000000504 900__ $$aManagement Board
000000504 900__ $$aAdvanced Electronics
000000504 900__ $$aX-Ray Optics
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000000504 9141_ $$a(c) Optical Society of America. Open Access.$$y2012
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