Record Details

Title:
Characterizing the focus of a multilayer coated off-axis parabola for FLASH beam at λ = 4.3 nm
Affiliation(s):
EuXFEL staff
Author group:
Instrument SPB/SFX
Abstract:
A super-polished substrate with an off-axis parabola figure was coated with a Sc/B4C/Cr multilayer. This optic was used to focus pulses of 4.3 nm photons from the Free-electron LASer in Hamburg (FLASH) at normal incidence. Beam imprints were made in poly(methyl methacrylate) to align the optic and to measure the beam profile at the focal plane. The intense interaction resulted in imprints with raised perimeters, surrounded by ablated material extending out several micrometres. These features interfere with the beam profile measurement. The effect of a post-exposure development step on the beam imprints was investigated. © (2013) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Imprint:
Bellingham, Wash., SPIE, 2013
conference Information:
Proc. of SPIE, 8777, 87770T (2013)
Related external records:
DOI: 10.1117/12.2022403
WOS: WOS:000329577700022
Conference information:
SPIE Optics + Optoelectronics: Advances in X-ray Free-Electron Laser Instrumentation, Prague, 2013-04-15 - 2013-04-18, Czech Republic
Record appears in:


Export


 Record created 2016-10-11, last modified 2019-02-08

Fulltext:
Download fulltext
PDF

Rate this document:

Rate this document:
1
2
3
 
(Not yet reviewed)