The European XFEL (X-ray Free Electron Laser) is a large facility under construction in Hamburg, Germany. It will provide a transversally fully coherent x-ray radiation with outstanding characteristics: high repetition rate (up to 2700 pulses with a 0.6 ms long pulse train at 10 Hz), short wavelength (down to 0.05 nm), short pulse (in the femtoseconds scale), and high average brilliance ($1.6 ⋅ 10^{25}$ (photons $s^{−1}$ $mm^{−2}$ $mrad^{−2}$)/0.1% bandwidth). The beam has very high pulse energy; therefore, it has to be spread out on a relatively long mirror (about 1 m). Due to the very short wavelength, the mirrors need to have a high quality surface on their entire length, and this is considered very challenging even with the most advanced polishing methods. In order to measure the mirrors and to characterize their interaction with the mechanical mount, we equipped a metrology laboratory with a large aperture Fizeau interferometer. The system is a classical 100 mm diameter commercial Fizeau, with an additional expander providing a 300 mm diameter beam. Despite the commercial nature of the system, special care has been taken in the polishing of the reference flats and in the expander quality. We report the first commissioning of the instrument, its calibration, and performance characterization, together with some preliminary results with the measurement of a 950 mm silicon substrate. The intended application is to characterize the final XFEL mirrors with nanometer accuracy.