Record Details

Title:
Interaction of short x-ray pulses with low-Z x-ray optics materials at the LCLS free-electron laser
Abstract:
Materials used for hard x-ray-free-electron laser (XFEL) optics must withstand high-intensity x-ray pulses. The advent of the Linac Coherent Light Source has enabled us to expose candidate optical materials, such as bulk B4C and SiC films, to 0.83 keV XFEL pulses with pulse energies between 1 μJ and 2 mJ to determine short-pulse hard x-ray damage thresholds. The fluence required for the onset of damage for single pulses is around the melt fluence and slightly lower for multiple pulses. We observed strong mechanical cracking in the materials, which may be due to the larger penetration depths of the hard x-rays.
Imprint:
Washington, DC, Soc., 2010
Journal Information:
Opt. Express, 18, 23933 (2010)
ISSN:
1094-4087
External related publications:
10.1364/OE.18.023933
pmid:21164739 (pmid)
WOS:000283940900064 (WOS)
Language(s):
English
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 Record created 2016-10-11, last modified 2017-11-22

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